September 15, 1994-August 31, 1999
Level of Access
A state-of-the-art advanced materials synthesis and processing facility focusing on the growth and fabrication of ceramic- based thin film materials will be funded with the assistance of the Academic Research Infrastructure Program. The facility will include a multi-technique thin film materials synthesis chamber equipped with a microwave plasma source, effusion cells, electron beam evaporators, magnetron sputter sources, and a Kauffman ion source. Characterization capabilities will include in-situ reflection high energy electron diffraction (RHEED), mass spectrometry for controlling growth processes, X-ray photoelectron spectroscopy (XPS), and a novel Hall probe for in- situ film characterization. Three major areas of research will be impacted significantly by the facility, namely 1) solid state micro-sensors, 2) nanomechanics of materials, and 3) surfaces and interfaces in hetero-epitaxial oxide systems. In the sensor work, which has connections with local industry, the synthesis and processing of well-defined doped metal-oxide films will be developed with the goal of understanding and controlling the molecular scale mechanisms by which surface microstructure, dopant type, and operating temperature influence sensor performance. A broad based advanced materials synthesis and processing facility for the growth and fabrication of ceramic-based thin films will be operated for the study of solid state microsensors based on metal-oxide ceramic films. The nanomechanics of these ceramic thin films will be studied, as well as the surfaces and interfaces occurring in heteroepitaxial oxide systems.
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Lad, Robert J.; Vetelino, John F.; Unertl, William; Dwyer, Daniel; and Frankel, David, "Acquisition of a Multi-User Thin Film Synthesis and Processing Facility" (2000). University of Maine Office of Research Administration: Grant Reports. 401.