Atomic layer deposition (ALD) is a self-limiting synthesis technique for the growth of conformal ultrathin films on solid state materials. The high conformality of the ALD method is ideal for coating porous, high surface area materials. A fluidized bed reactor (FBR) was designed and built for functionalizing a powder using ALD. The particle bed was fluidized using an inert argon gas. Aluminum oxide (Al2O3) was deposited on a high surface area powder substrate, γ-phase aluminum oxide, via ALD using trimethylaluminum (TMA) and water (H2O) as gas phase precursors. Depositions were done under low pressure conditions. A BET analysis was done on the powder to confirm deposition of Al2O3 on the powder. Less coating was observed on the particles in comparison to literature.
Altvater, Natalie, "The Design and Fabrication of an Atomic Layer Deposition Reactor for Coating Powders" (2017). Honors College. 286.