Honors College

Document Type

Honors Thesis

Publication Date

Spring 5-2017


Atomic layer deposition (ALD) is a self-limiting synthesis technique for the growth of conformal ultrathin films on solid state materials. The high conformality of the ALD method is ideal for coating porous, high surface area materials. A fluidized bed reactor (FBR) was designed and built for functionalizing a powder using ALD. The particle bed was fluidized using an inert argon gas. Aluminum oxide (Al2O3) was deposited on a high surface area powder substrate, γ-phase aluminum oxide, via ALD using trimethylaluminum (TMA) and water (H2O) as gas phase precursors. Depositions were done under low pressure conditions. A BET analysis was done on the powder to confirm deposition of Al2O3 on the powder. Less coating was observed on the particles in comparison to literature.